Direct Projection UV Photolithography TTT-07-UV Litho-ACA Pro
TTT-07-UV Litho-ACA+ maskless UV lithography machine guarantees an outstanding critical dimension of 0.6 µm (objective lens C). The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 6-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as two-dimensional materials, electrical transport testing, photoelectric testing, terahertz and millimetre wave devices.