Direct Projection UV Photolithography TTT-07-UV Litho-Y
TTT-07-UV Litho-Y table-top maskless UV lithography machine guarantees an outstanding critical dimension of 1.5 µm (objective lens A). The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 2-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as two-dimensional materials, electrical transport testing, photoelectric testing, terahertz and millimetre wave devices.
Direct Projection UV Photolithography TTT-07-UV Litho-ACA
TTT-07-UV Litho-ACA maskless UV lithography machine guarantees an outstanding critical dimension of 1 µm (objective lens B). The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 6-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as two-dimensional materials, electrical transport testing, photoelectric testing, terahertz and millimetre wave devices.
Direct Projection UV Photolithography TTT-07-UV Litho-ACA Pro
TTT-07-UV Litho-ACA+ maskless UV lithography machine guarantees an outstanding critical dimension of 0.6 µm (objective lens C). The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 6-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as two-dimensional materials, electrical transport testing, photoelectric testing, terahertz and millimetre wave devices.
Direct Projection UV Photolithography TTT-07-UV Litho-S
TTT-07-UV Litho-S scanning maskless UV lithography machine guarantees an outstanding critical dimension of 1 µm and the exposure speed can up to 1000 mm2/min. The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 8-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as mask preparation and semiconductor packing.
Direct Projection UV Photolithography TTT-07-UV Litho-S+
TTT-07-UV Litho-S scanning maskless UV lithography machine guarantees an outstanding critical dimension of 1 µm and the exposure speed can up to 1000 mm2/min. The machine is equipped with high-performance direct drive linear motors with 50 nm closed-loop encoder system, and supports a wide range of wafer dimensions from 3 mm to 8-inch. The DMD-based lithography technology is equivalent to a programmable digital photomask possessing numerous advantages such as high efficiency, high flexibility, high resolution and high reliability. The equipment can be utilized in many studies, such as mask preparation and semiconductor packing.
The integration of Lithography and 3D Manufacturing, the epitome of high precision .Interchangeable Lens, Multiple Exposure Wavelength, High Efficiency, High Precision.
Magnetic Hysteresis Loop Analyzer Based on Magneto-Optic Kerr Effect
The laser wavelength is 633 nm, the spot diameter is 1 mm, the Kerr angle resolution is 0.001°, the magnetic field strength is plus or minus 0.36 T, and the sample size is < 25 mm*25 mm.
Magnetic domain resolution <1μm, integrated magnetic field, low temperature, grid voltage, laser, microwave and other variables in one, magnetic-optical-electrical synchronous measurement, vertical magnetic field strength up to 1.4 T, horizontal magnetic field strength up to 0.7 T.
TuoTuo Technology photocurrent spectrum test system is suitable for micron-scale point-line-surface scanning test of photocurrent, spectrum and fluorescence lifetime.
Free combination of required wavelength lasers; programmable 0-100mW power adjustment; programmable TTL frequency modulation; including, but not limited to 405nm, 473nm, 532nm, 671nm, 808nm, 1064nm, 1342nm, 1550nm.
